ข้อมูลสัญลักษณ์จำแนกการออกแบบผลิตภัณฑ์ระหว่างประเทศ


รหัส / code คำอธิบาย / code name Version
H01L0021320000 using masks 1
H01L0021320500 Deposition of non-insulating-, e.g. conductive- or resistive-, layers, on insulating layers; After-treatment of these layers (manufacture of electrodes H01L0021280000) 1
H01L0021321000 After-treatment 1
H01L0021321300 Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer 1
H01L0021321500 Doping the layers 1
H01L0021322000 to modify their internal properties, e.g. to produce internal imperfections 1
H01L0021324000 Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering (H01L0021200000-H01L0021288000, H01L0021302000-H01L0021322000; take precedence);; 1
H01L0021326000 Application of electric currents or fields, e.g. for electroforming (H01L0021200000-H01L0021288000, H01L0021302000-H01L0021324000; take precedence);; 1
H01L0021328000 Multistep processes for the manufacture of devices of the bipolar type, e.g. diodes, transistors, thyristors 1
H01L0021329000 the devices comprising one or two electrodes, e.g. diodes 1
H01L0021330000 the devices comprising three or more electrodes 1
H01L0021331000 Transistors 1
H01L0021332000 Thyristors 1
H01L0021334000 Multistep processes for the manufacture of devices of the unipolar type 1
H01L0021335000 Field-effect transistors 1