ข้อมูลสัญลักษณ์จำแนกการออกแบบผลิตภัณฑ์ระหว่างประเทศ


รหัส / code คำอธิบาย / code name Version
G03F0001480000 Protective coatings 1
G03F0001500000 Mask blanks not covered by groups ; G03F0001200000-G03F0001260000; Preparation thereof 1
G03F0001520000 Reflectors 1
G03F0001540000 Absorbers, e.g. opaque materials 1
G03F0001560000 Organic absorbers, e.g. photo-resists 1
G03F0001580000 having two or more different absorber layers, e.g. stacked multilayer absorbers 1
G03F0001600000 Substrates 1
G03F0001620000 Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof 1
G03F0001640000 characterised by the frames, e.g. structure or material thereof 1
G03F0001660000 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof 1
G03F0001680000 Preparation processes not covered by groups ; G03F0001200000-G03F0001500000 1
G03F0001700000 Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging 1
G03F0001720000 Repair or correction of mask defects 1
G03F0001740000 by charged particle beam [CPB], e.g. focused ion beam 1
G03F0001760000 Patterning of masks by imaging 1