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ข้อมูลสัญลักษณ์จำแนกการออกแบบผลิตภัณฑ์ระหว่างประเทศ

รหัส / code คำอธิบาย / code name Version
G03F0001200000 Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof 1
G03F0001220000 Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof 1
G03F0001240000 Reflection masks; Preparation thereof 1
G03F0001260000 Phase shift masks [PSM]; PSM blanks; Preparation thereof 1
G03F0001280000 with three or more diverse phases on the same PSM; Preparation thereof 1
G03F0001290000 Rim PSM or outrigger PSM; Preparation thereof 1
G03F0001300000 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof 1
G03F0001320000 Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof 1
G03F0001340000 Phase-edge PSM, e.g. chromeless PSM; Preparation thereof 1
G03F0001360000 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes 1
G03F0001380000 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof 1
G03F0001400000 Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate 1
G03F0001420000 Alignment or registration features, e.g. alignment marks on the mask substrates 1
G03F0001440000 Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales  1
G03F0001460000 Antireflective coatings 1
จำนวนรหัสข้อมูล 15 จาก 73902